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Improved Phase-Mask Fabrication of Fiber Bragg Gratings An improved method of fabrication of Bragg gratings in optical fibers combines the best features of two prior methods: one that involves the use of a phase mask and one that involves interference between the two. We present to the best of our knowledge the first example of femtosecond laser inscription/ablation of phase/amplitude masks for the demonstrated purpose of inscribing Bragg gratings in optical fibers. The phase mask technique used for writing fiber gratings has the advantages over the traditional holographic method because of its.
This technique is especially attractive for use in OEICs and PICs when fabrication of the grating masks is accomplished with e-beam lithography and dry etching, since the diffractive
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A phase mask is defined as a relief grating etched in a UV-transmitting silica plate, used in transmission to diffract an incident UV beam into multiple orders, facilitating the inscription of fiber
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Among others, the phase-mask technique is widely used for fiber Bragg grating fabrication due to its simplicity and suitability for mass production. The fixed pitch of the phase-mask imposes limitations
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This paper reports on the fabrication process of phase mask for fiber grating printing. The masks are produced by Electron Beam Lithography (EBL) and Reactive Ion Etching (RIE). A special
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K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, and J. Albert, "Bragg gratings fabricated in monomode photosensitive optical fibre by UV exposure through a phase mask", Applied Physics Letters, 62 (10),
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We present to the best of our knowledge the first example of femtosecond laser inscription/ablation of phase/amplitude masks for the demonstrated purpose of inscribing Bragg gratings in optical fibers.
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Using a fused silica phase mask in a 520 nm wavelength femtosecond laser with a period of 1 067 nm, a ruled area 40 mm×30 mm was fabricated via holographic lithography-ion beam etching.
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A fused silica phase mask with the period of 1069nm, and ruled area 50×50mm2 has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This
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Since its demonstration in 2003, Bragg grating inscription with high-power femtosecond pulse duration infrared sources and phase masks has proven
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This paper presents an investigation of a fabricated fiber grating device characteristics and its applications, using a phase mask writing technique. The
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Abstract: A novel phase mask (PM) consisting of overlapped regions of more than one uniform pitch is fabricated using e-beam lithography. Design, fabrication of PMs, and filter characteristics are presented.
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This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and
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Our grating products today include phase masks, telecom gratings, pulse compression gratings and spectrometer gratings. By combining unique optical
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Phase-shifted-gratings and arrays of fiber-Bragg-gratings are inscribed with a uniform phase-mask. These gratings are inscribed with 800 nm femtosecond pulses and a uniform phase-mask where the
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A photolithographic method is described for fabricating refractive index Bragg gratings in photosensitive optical fiber by using a special phase mask
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A novel phase mask (PM) consisting of overlapped regions of more than one uniform pitch is fabricated using e-beam lithography. Design, fabrication of PMs, and filter characteristics are presented.
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The phase mask technique used for writing fiber gratings has the advantages over the traditional holographic method because of its simpler writing setup and more
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This paper reports the experimental results that near 100% peak reflectivity fiber Bragg grating have been fabricated by 248 nm KrF excimer laser irradiated a B/Ge co-doped fiber through a zero-order
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Bragg gratings written directly through the polymer coatings of optical fibers with femtosecond IR lasers and a phase mask result in devices with
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This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion
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In this paper, we demonstrate a fiber Bragg grating (FBG) with a wide range and a comb with continuous cladding mode resonances inscribed in non
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Figure 2.5 illustrates the most widely used phase-mask technique to inscribe a BG in an optical fiber , using a diffractive optical component (a transmission
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In this work, a simple phase-shifted fiber grating (PSFG) inscription technique based on screening method was demonstrated, in which a standard single-mode fiber (SMF) is irradiated by
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Abstract In this paper, Fiber Bragg Gratings (FBGs) are written by photoinduced refractive index changes in optical fibers. Experimental setup and results are presented to show the growth
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The first to achieve good commercialization of DTG technology from FBG manufacturing to FBG engineering applications. A method of on-line dynamic preparation of drawing tower grating
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An improved method of fabrication of Bragg gratings in optical fibers combines the best features of two prior methods: one that involves the use of a phase mask and one that involves interference between
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